摘要
综述了涂层超导体缓冲层的作用、可利用的材料及制备方法。着重介绍了几种制备缓冲层的真空及非真空方法,即磁控溅射法、脉冲激光沉积(PLD)、溶胶-凝胶法(sol-gel)、电沉积等。展望了对下一步涂层超导体缓冲层的制备。
The functions, usable materials and deposition of buffer layers for coated superconductors were reviewed. From the viewpoint of vacuum and non-vacuum deposition of buffer layers, several primary methods were emphasized, such as magnetic sputtering, PLD, sol-gel and electrodeposition. The prospect for preparing the buffer layers for coated superconductors was put forward.
出处
《表面技术》
EI
CAS
CSCD
2007年第5期81-83,共3页
Surface Technology
关键词
涂层超导体
缓冲层
真空沉积
非真空沉积
Coated superconductor
Buffer layer
Vacuum deposition
Non-vacuum deposition