将平面用溅射装置改造为微粒用溅射装置

Altering the Sputtering Equipment Used for Planes to that for Particulates

采用在真空室内加旋转筒的方法,将某平面用溅射装置改造为微粒用溅射装置。运行结果表明,利用筒体旋转的方法,可以在粒度100μm左右的微粒表面包覆均匀完整的铬膜层,微粒形状对表面涂层的均匀、完整、涂层速度等有重要影响,微粒被筒体带动的力主要为二者间的分子间作用力,离心力起的作用很小。若将用于平面镀涂的溅射装置改造为处理微粒,需对溅射装置中的溅射靶和真空系统进行较大的改造。

A sputtering equipment used for planes has been alternated to that for particulates (～100μm) by adding a rotating canister in its vacuum chamber. The results show that particulates can be brought by the rotating canister and pass the depositing area in the falling course. The adhesion force of the particulate to the canister is from the molecular force each other,especially static force. The figure of the particulates has important influence on the effect of their surface coatings. Using the rebuilt equipment and the D.C magnetron sputtering technology,the uniformity and rounded and microns chromium films have been gotton triumphantly on the surface of the particulate. It is approved that the way is available,and that it is necessary to alter the sputtering target and vacuum system.