钛膜的电解抛光技术研究

Investigation on electropolishing of Ti film

分析了硫酸、硝酸、氢氟酸；硫酸、乙酸、氢氟酸；乙醇、正丁醇、氯化锌、氯化铝；高氯酸、乙酸；硫酸、甲醇这5种不同电解液组成对钛薄膜表面粗糙度、表面形貌的影响．得出硫酸、甲醇混合溶液是一种较理想的电解液体系。设置合适的抛光电压、温度、时间、泵速等工艺参数，制备出了表面平整光滑．平均粗糙度小于30nm的钛膜。分析了硫酸、甲醇电解液阳极电压与试样表面减薄速率的关系：试样的减薄速率开始随电压的升高而增大；当电压达到28～34V时．减薄速率随电压变化很慢．当电压继续增大时，减薄速率又会迅速增大，金属膜继续溶解。

The influence of electrolyte component on the surface roughness and topography of Ti film has been analyzed. It is found that, the solution of sulfuric acid and methanol is an ideal electrolyte system compared with the other electrolyte systems mentioned in this paper. The Ti films with surface mean roughness value less than 30 nm were obtained under appropriate electro- polishing process conditions such as polishing potential, temperature, time, flow rate etc. The relation between anodic potential and removal rate of the metal was investigated in the solution of sulfuric acid and methanol. The removal rate increases with the polishing potential increasing at the initiative stage of polishing. When the potential reaches 28～42V,the rate keeps almost constant. The rate increases swift again when the potential continues increasing.