双离子束溅射沉积HfO_2光学薄膜的研究

HfO_2 optical films prepared by dual ion beam sputtering deposition

用双离子束溅射沉积氧化铪光学薄膜,并对此工艺下制备的氧化铪薄膜进行了光学性质、残余应力、结构特性以及激光损伤特性的研究。实验结果表明,用双离子束溅射沉积的氧化铪薄膜不仅结构均匀,膜层致密,无定形结构,而且具有极低的散射和吸收,均匀的非晶结构,杂质缺陷少,激光损伤阈值高。

HfO2 films have been deposited by dual-ion beam sputtering technology with starting material Hr. Optical, residual stress, structural properties and laser-induced damage threshold of the HfO2 films have been studied. It is found that the HfO2 shows uniform structural properties, film compact and structure and higher laser-induced damage threshold. The relation between structural and damage threshold of HfO2 films has also been studied.