射频电源有关问题的探讨

Discussion on some problems of RF power source

在射频溅射镀膜中,射频电源的反射功率偏大和靶打火一直是困扰行业的问题,本文从理论上说明射频系统和网络匹配问题,并结合实际和试验,讨论如何降低反射功率和减少靶打火的问题,并提供解决问题的相关资料,以资说明。

The RF reflecting power is found too high and flash arc occurs during RF film sputtering deposition. The two problems have been puzzling workshops for long. The RF system and network matching were thus discussed theoretically combining practice with tests to control the reflecting power so as to make it within a certain range and minimize the occurence of flash arc. The result showed that the RF system can be improved.