摘要
类金刚石膜(Diamond-like Carbon,DLC)的沉积过程直接影响着薄膜分子结构,从而决定着最终薄膜的物理化学特性。采用分子动力学模拟的方法,计算了以C原子为沉积物,在50eV和100eV入射能量下制备无氢DLC膜的动力学过程,详细考察了不同生长阶段表面生成膜的生长特性。通过比较,模拟结果观察到并揭示出在一定的入射能量冲击下,基体表面薄膜的一种新的点—链—网成长过程及薄膜形成机制。同时发现,随着入射能量的增加,基底的逃逸原子数亦相应增加,基底原子向表面薄膜的扩散和渗透距离变长,薄膜密度在入射能量较高时,变化数量及趋势基本一致。
The deposition process is an important factor affecting the structural properties of DLC （ Diamond-like Carbon） film. Carbon atoms were selected as the source species to deposit DLC films by molecular dynamics simulation. The growth properties were investigated and elucidated. By comparison, results show a new point-chain-network growth mechanism during deposition in simulation. The number of escaped atoms and the distance of diffusion increase with the increase of impact energy. The value and variation of density are approximately identical.
出处
《润滑与密封》
CAS
CSCD
北大核心
2007年第10期4-7,28,共5页
Lubrication Engineering
基金
国家自然科学基金资助项目(50575173)
关键词
类金刚石膜
分子动力学模拟
生长特性
diamond-like carbon （DLC） film
molecular dynamics simulation
growth properties
