摘要
利用新型的阳离子聚合物膜将四硫富瓦烯修饰到电极表面上,并研究了修饰电极的电化学行为。研究了浸泡时间、扫描速度和支持电解质对修饰电极性能的影响;循环伏安法、计时电流法和交流阻抗法表明四硫富瓦烯在膜中的扩散是控制步骤。四硫富瓦烯在膜中的第一对氧化还原峰呈现可逆的、单电子反应。用循环伏安法测得了TTF+TTFZTTF反应的平衡常数。
Tetrathiafulvalene (TTF) was coated onto microelectrode surface with Eastman- AQ 29D polymer film and the electrochemical behavior of the resulting modified electrodes was investigated. The effects of dipping time, scan rate and supporting electrolyte on the modified microelectrode were examined. TTF is oxidized in two consecutive, one-electron steps to TTF+ and then to TTF2+ in the film. The equilibrium constant of TTF+TTF++ 2TTF+ in the Eastman-AQ 29D film determined by cyclic voltammetry is 1. 25 X 106.
出处
《分析化学》
SCIE
EI
CAS
CSCD
北大核心
1997年第2期125-129,共5页
Chinese Journal of Analytical Chemistry
关键词
微盘电极
修饰电极
聚合物
膜
四硫富瓦烯
Modified electrode,mocrodisk electrode,Eastman-AQ 29D polymer,tetrathiaful- valene