ZnO薄膜的结构与光学性能研究

Study on structure and optical properties of ZnO thin films

采用sol-gel法在石英衬底上制备了ZnO薄膜,通过改变溶胶浓度、涂敷层数及退火温度,研究了ZnO薄膜的形貌、结构性能及光学性能。结果表明,薄膜具有六方纤锌矿结构,表面均匀致密,晶粒大小在25～35nm之间,Zn含量为0.8mol/L的溶胶经旋涂并在500℃下退火1h后可获得最高的可见光透射率,平均透射率约为94%。获得的ZnO薄膜的光学带隙在3.27～3.29eV之间。

ZnO thin films were prepared on quartz substrate by sol-gel method. The effects of sol concentration, deposited layer number and annealing temperature on the surface morphology, microstructure and optical properties of the films were investigated. The results indicate that ZnO films have a homogeneous and dense surface with the crystalline structure of hexagonal wurtzite. The crystalline dimension is of 25-35 nm.The ZnO thin film that is annealed at 500 ℃ for 1 hour using a Zn concentration of 0.8 mol/L in sol has a largest transmittance of 94% on average in visible wavelength range. The obtained optical band gap in the films is 3.27-3.29 eV.