摘要
Enhanced near-infrared （NIR） electroluminescence （EL） of a metal-oxide-semiconductor light emitting device （MOSLED） made on CO2 laser-annealed SiOx film is demonstrated. An EL power of near 50 nW from CO2 laser rapid-thermal-annealing （RTA） MOSLED under a biased voltage of 85 V and a current density of 2.3 mA/cm^2 is preliminarily reported.
Enhanced near-infrared （NIR） electroluminescence （EL） of a metal-oxide-semiconductor light emitting device （MOSLED） made on CO2 laser-annealed SiOx film is demonstrated. An EL power of near 50 nW from CO2 laser rapid-thermal-annealing （RTA） MOSLED under a biased voltage of 85 V and a current density of 2.3 mA/cm^2 is preliminarily reported.
