摘要
以银层抗变色特性为主要指标,对双向脉冲光亮镀银的工艺参数进行了优选,最佳脉冲参数为:频率800Hz、正向占空比为10%、负向占空比为零。在最佳参数下得到的银镀层光亮平滑,抗变色能力优良,与直流光亮镀银相比较,抗变色性能提高10%以上。
The optimum pulse parameters of double direction pulse electrodeposition of bright sil- ver which are 800Hz pulse frequency, 1 0% positive duty cycle and 0 negative duty cycle were ob- tained by comparing the aati-tarish property of deposited silver. The anti-arish property of the smooth and bright deposit under optimum conditions is 10% over that of the deposit under dc conditions .
出处
《哈尔滨工业大学学报》
EI
CAS
CSCD
北大核心
1997年第2期77-79,共3页
Journal of Harbin Institute of Technology
关键词
镀银
脉冲电镀
抗变色性
电镀
Electrodeposition of bright silver: pulse plating: anti-tarish property