摘要
利用Ｘ射线衍射研究了化学气相沉积的金刚石薄膜的应力情况。研究表明：热应力在研究范围内为压应力，本征应力是张应力。分析了薄膜厚度、生长温度。
The stress in diamond films by the hot filament assisted chemical vapor deposition process was studed by X ray diffraction technique.The investigation shows that the thermal stress is compressive in the temperature range studied and the intrinsic stress is tensile.The influence of various experimental parameters on the stress in films was analysed.
出处
《高压物理学报》
CAS
CSCD
北大核心
1997年第1期56-60,共5页
Chinese Journal of High Pressure Physics
关键词
化学气相沉积
金刚石
薄膜
应力
chemical vapor deposition,diamond films,X ray diffraction ,stress.
