摘要
采用离子注入法在纯镁表面注入Ti离子。用XRD和EDS对镀层进行分析。结果表明,Ti离子的注入深度为1.5μm左右,注入层由MgO、TiO2、TiO等氧化物组成,硬度提高。
Ti ion was implanted on the surface of magnesium alloy by ion implantation method. The implanted sample was analyzed by XRD and EDS. The results show that the implanting depth of Ti ion is about 1.5 μm, the implanting layer consists of MgO, TiO2 and TiO, and its microhardness increases.
出处
《热加工工艺》
CSCD
北大核心
2007年第20期70-71,共2页
Hot Working Technology
关键词
纯镁
离子注入
TI
magnesium
ion implantation
Ti