摘要
本研究合成了甲基丙烯酸叔丁酯(TBMA)的均聚物及其与甲基丙烯酸(MAA)、苯乙烯(St)的共聚物,并与二乙烯基醚(BPA-DEVE)和光生酸剂(PAG)构成光敏成像体系。研究了两种不同光生酸剂和不同后烤版温度下体系的成像条件。研究表明:3,4-二甲氧基苯乙烯三嗪(DMOPV-TA)曝光产生的HCl对树脂中TBMA单元的酸解效果较差,但其对羧酸和BPA-DEVE形成的交联结构有较好的解交联效果;三苯胺硫鎓盐(TPASS)曝光产生的三氟甲磺酸对树脂中TBMA单元的酸解及体系解交联都有较好效果;同时,后烤版温度为140℃时成像感度高;在一定范围内,共聚树脂中MAA含量增加,体系的成像感度也增加。
In this study,a homopolymer and a series of copolymers of tert-butyl methacrylate（TBMA） with methacrylic acid（MAA） and styrene（St） were synthesized.And these copolymers were used to make a photosensitive imaging system with bisvinyl ether（BPA-DEVE） and photochemical acid generator（PAG）.The imaging factors of two different PAGs and different postbaking temperatures were investigated.The experiments results indicated that 3,4-dimethoxyphenyl vinyl triazine had a poor acid effect on TBMA unit in coplymers and a better decrosslinking effect on crosslinking of carboxylic acid and BPA-DEVE.While triphenylamine sulfonium salt had a better effect on both.And imaging sensitiviety was high when postbaking temperature was at 140℃ and in some range,more content of MAA in the copolymers results in higher imaging sensitivety.
出处
《影像技术》
CAS
2007年第5期23-26,共4页
Image Technology
