摘要
The controlled growth of Zn-polar ZnO fihns on Al-terminated α-Al203 （0001） substrates is investigated by the radio-frequency plasma-assisted molecular beam epitaxy method. Prior to the growth, α-Al2O3 （0001） surface is modified by an ultrathin MgO layer, which serves as a uniform template for epitaxy of Zn-polar ZnO films. The microstructures of ZnO/MgO/Al2O3 interface are investigated by in-situ reflection high-energy electron diffraction observations and ex-situ high-resolution transmission electron microscopy characterization. It is found that under Mg-rich condition, the achievement of the wurtzite MgO ultrathin layer plays a key role in the subsequent growth of Zn-polar ZnO. An interracial atomic model is proposed to explain the mechanism of polarity selection of both MgO and ZnO films.
The controlled growth of Zn-polar ZnO fihns on Al-terminated α-Al203 （0001） substrates is investigated by the radio-frequency plasma-assisted molecular beam epitaxy method. Prior to the growth, α-Al2O3 （0001） surface is modified by an ultrathin MgO layer, which serves as a uniform template for epitaxy of Zn-polar ZnO films. The microstructures of ZnO/MgO/Al2O3 interface are investigated by in-situ reflection high-energy electron diffraction observations and ex-situ high-resolution transmission electron microscopy characterization. It is found that under Mg-rich condition, the achievement of the wurtzite MgO ultrathin layer plays a key role in the subsequent growth of Zn-polar ZnO. An interracial atomic model is proposed to explain the mechanism of polarity selection of both MgO and ZnO films.
基金
Supported by the National Natural Science Foundation of China under Grant No 60606023 and 50532090, the National Basic Research Programme of China under Grant No 2002CB613502, and Chinese Academy of Sciences.
