期刊文献+

Chemical Oxidation of La2CuO4 Epitaxial Thin Films Grown by Pulsed Laser Deposition

Chemical Oxidation of La2CuO4 Epitaxial Thin Films Grown by Pulsed Laser Deposition
下载PDF
导出
摘要 Chemical oxidation is used to induce superconductivity in La2CuO4 expitaxial thin films fabricated by pulsed laser deposition technique. Details about the influence of oxidation time on structural, surface morphology, Raman spectra, and electrical properties have been investigated. The results convince that successful uptake of oxygen occurs in the oxidized films, and the content of the inserted oxygen increases with increasing oxidation interval. The possible mechanism for the excess oxygen insertion into the film is also discussed. Chemical oxidation is used to induce superconductivity in La2CuO4 expitaxial thin films fabricated by pulsed laser deposition technique. Details about the influence of oxidation time on structural, surface morphology, Raman spectra, and electrical properties have been investigated. The results convince that successful uptake of oxygen occurs in the oxidized films, and the content of the inserted oxygen increases with increasing oxidation interval. The possible mechanism for the excess oxygen insertion into the film is also discussed.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2007年第6期1674-1677,共4页 中国物理快报(英文版)
基金 Support by the National Natural Science Foundation of China, the National Key Basic Research Programme of China, and the State Key Lab of New Ceramics and Fine Processes.
关键词 ELECTROCHEMICAL OXIDATION SPIN FLUCTUATIONS THERMAL-TREATMENT RAMAN-SCATTERING SUPERCONDUCTIVITY TEMPERATURE INDUCTION NACLO EFFUSION ELECTROCHEMICAL OXIDATION SPIN FLUCTUATIONS THERMAL-TREATMENT RAMAN-SCATTERING SUPERCONDUCTIVITY TEMPERATURE INDUCTION NACLO EFFUSION
  • 相关文献

参考文献30

  • 1Bednorz J G and Miiller K A 1986 Z. Phys. B 64 189
  • 2Tholence J L 1987 Physica B 148 353
  • 3Jorgensen J D, Dabrowshi B, Pei S Y, Hinks D G, Soderholm L, Morosin B, Schirber J E, Venturini E L and Ginley D S 1994 Phys. Rev. B 38 1337
  • 4Wells B O, Lee Y S, Kastner M A, Christianson R J, Birgeneau R J, Yamada K, Endoh Y and Shirane G 1997 Science 277 1067
  • 5Beille J, Chevalier B, Demazeau G, Deslandes F, LeJay P and Provost J 1987 Physica B+C 146 307
  • 6Wattiaux A, Park J C, Grenier J C and Pouchard M 1990 C. R. Acad. Sci. 31{} 1047
  • 7Rudolf P and Sch?llhorn R 1992 J. Chem. Soc. Chem. Commun. 1992 158
  • 8Takayama-Muromachi E, Sasaki T and Matsui Y 1993 Physica C 207 97
  • 9Locquet J P, Gerber C, Cretton A, Jaccard Y, Williams E J and Machler E 1993 Appl. Phys. A 57 211
  • 10Locquet J P, Arrouy F, Machler E, Despont M, Bauer P and Williams E J 1996 Appl. Phys. Lett. 68 1999

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部