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Oscillations of Magnetized Dust Grains in Plasma Sheath with Negative Ions

Oscillations of Magnetized Dust Grains in Plasma Sheath with Negative Ions
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摘要 The oscillations of a single magnetized dust grain in electronegative plasma sheath are investigated taking into account the existence of an external magnetic field. The influence of the content of negative ions and the magnetic field intensity on the properties of the dust vibration is analysed. The result shows that the existence of the negative ions in plasma reduces the dust oscillation frequency and drops the equilibrium position of dust, whereas the magnetic field raises the equilibrium position and also reduces the dust oscillation frequency on the condition considered. The oscillations of a single magnetized dust grain in electronegative plasma sheath are investigated taking into account the existence of an external magnetic field. The influence of the content of negative ions and the magnetic field intensity on the properties of the dust vibration is analysed. The result shows that the existence of the negative ions in plasma reduces the dust oscillation frequency and drops the equilibrium position of dust, whereas the magnetic field raises the equilibrium position and also reduces the dust oscillation frequency on the condition considered.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2007年第7期2003-2005,共3页 中国物理快报(英文版)
基金 Supported by the National Natural Science Foundation of China under Grant Nos 10375063 and 40336052.
关键词 PARTICLES PARTICLES
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参考文献12

  • 1Chu J H and Lin I 1994 J. Phys. D 27 296
  • 2Pieper J B and Goree J 1996 Phys. Rev. Lett. 77 3137
  • 3Nefdov A P et al 2001 IEEE Trans. Plasma Sci. 29 210
  • 4Sheridan T E 2005 Phys. Plasmas 12 080701
  • 5Takamura S et al 2001 Phys. Plasmas 8 1886
  • 6Vaulina O S et al 2003 Plasma Phys. Rep. 29 698
  • 7Samsonov D et al 2003 New J. Phys. 5 24
  • 8Vladimirov S V et al 2003 Phys. Rev. E 62 2739
  • 9Yaroshenko V V et al 2003 New J, Phys. 5 181
  • 10Trottenberg T, Melzer A and Piel A 1995 Plasma Sources Sci. Technol. 4 450

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