摘要
首次报告了用国产的廉价的ZC36型微电流测试仪测量非晶硅有效隙态密度的原理和结果,其结果与美国生产的昂贵的4061A型半导体综合测试仪测量结果相一致。
The principle and result of measuring effective density of gap states in amor- phous silicon with type of ZC36 micmgalvanometer which is cheap equipment made in P R China are first reported in this paper. The result is in agreement with one measured with type of 4061A semiconductor synthetical measurement equipment which is expensive made in U . S. A.
出处
《湖南大学学报(自然科学版)》
EI
CAS
CSCD
1997年第3期17-20,共4页
Journal of Hunan University:Natural Sciences
关键词
非晶硅
隙态密度
半导体
微电流测试仪
amorphous silicon , measurement equipment , gap state density