氧离子束辅助沉积氧化铪薄膜的激光损伤阈值研究

The investigation of laser-induce damage threshold of HfO_2 films prepared with oxygen ion beam assisted deposition

电子枪蒸发制备了氧化铪薄膜,对氧离子束辅助和未辅助两种情况下的样品进行了折射率、吸收、激光损伤阈值等属性的测试,结果表明,氧离子束辅助沉积的样品与未辅助沉积的样品相比具有高的折射率和高的吸收,以及稍低的激光损伤阈值。经过分析发现,薄膜的激光损伤阈值是影响薄膜抗激光特性的不利因素和有利因素竞争的结果,离子束辅助沉积技术在引入结构致密等有利因素的同时,也引入了吸收增加等不利因素。

Using e - beam evaporation, HfO2 films were prepared. The characteristics of refractive index, weak absorption, laser - induce damage threshold were measured. It was showed that Hf02 film prepared with ion beam assisted deposition has higher refractive index, higher absorption, and lower laser- induce damage threshold. Through the analysis, it was pointed that the disadvantages and advantages were introduced by IBAD at the same time and laser - induce damage threshold of films were the results of disadvantages and advantages competition.