化学水浴法制备ZnS薄膜及其光学性能

Chemical bath deposition of ZnS thin film and its optical properties

以酒石酸与柠檬酸钠为络合剂,采用化学水浴法(CBD)沉积ZnS薄膜。利用X射线衍射仪(XRD)、X射线能谱仪(EDAX)、扫描电镜(SEM)、紫外-可见分光光度计(UV-Vis)研究ZnS薄膜的结构、组成、形貌及光学性能,利用透射光谱计算ZnS薄膜的光学禁带宽度(Eg)。结果表明:ZnS薄膜呈立方相晶体结构,经过300℃热处理1h的ZnS薄膜原子比为Zn∶S=1∶0.85,表面均一致密,在可见光区的平均透射率达到80%,光学禁带宽度为3.74ev,适合作为太阳能电池过渡层。

ZnS thin film was prepared by chemical bath deposition（CBD） method using tartaric acid and tri-sodium citrate as complexing agents. The crystalline structure of the films was characterized by X-ray diffraction （XRD）, and the composition was analyzed by energy dispersive X-ray analysis （EDAX）. Scanning electron microscopy （SEM） was used to study the morphology of the surface of the samples. The optical properties of ZnS film were determined by ultraviolet-visible spectrophotometer （UV-Vis） and the energy band gap （Eg） was calculated from the transmission spectra. The results showed that： All the ZnS thin films deposited by chemical bath method have a crystalline structure of cubic phase. And the atomic ratio Zn/S of the thin film annealed at 300℃ in vacuum for an hour is about 1：0.85. The surface of the sample was uniform and compact. And it produceed an average transmittance reaching up to 80% over the visible range. The energy band gap （Eg） obtained by calculating is about 3.74ev, which is suitable for buffer layer of the solar cell.