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导致金刚石薄膜不均匀沉积的机理

INVESTIGATION OF THE MECHANISM RESULTING IN THE NONUNIFORM DEPOSITION OF DIAMOND FILM
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摘要 以MPCVD法合成金刚石薄膜的实验结果为基础,深入分析了微波等离子体性质对金刚石薄膜沉积过程的影响,提出了解释金刚石薄膜不均匀沉积现象的新机理。 Based on the experimental results of depositing diamond film by MPCVDmethod, the effect of the characteristics of microwave induced plasma on the process of diamond deposition is thoroughly analysed. A new mechanism causing nonuniform diamonddeposition had been put forward, which considers the main factor to be the nonuniform distribution of supersaturated atomic hydrogen resulted from the nonuniform distribution ofelectrons in microwave induced plasma.
机构地区 清华大学
出处 《金属学报》 SCIE EI CAS CSCD 北大核心 1997年第6期650-654,共5页 Acta Metallurgica Sinica
关键词 金刚石薄膜 不均匀沉积 机理 MPCVD diamond film, nonuniform deposition, mechanism
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