摘要
1 Introduction Ion sources with wide energy and current ranges are used extensively in industrial applications such as ion implantation, etching, and deposition. Broad beam ion sources with a uniform current distributions are needed for many industrial applications and development of commercial ion bean technologies for surface modification of materials is impossible without highly efficient, simple, and dependable ion sources. These and other needs have spurred the development of high efficiency ion sources that can produce ion beams with high energy and current and require low or no maintenance.
