直流等离子体喷射CVD技术制备自支撑金刚石膜的新结构和新形貌(英文)

Novel Structure and Morphology of Self-standing Diamond Film Deposited by DC Arc Plasma Jet CVD

采用30kW高功率直流等离子体喷射CVD技术制备了自支撑金刚石膜的新型结构,通过使甲烷与氢气的浓度比随沉积时间变化的方法,制备了两层、三层和四层结构。扫描电镜结果显示所制备的层结构是由柱状晶和非常细晶粒组成的,而拉曼谱结果表明这层细晶粒具有纳米金刚石的激光散射特征。在甲烷与氢气的浓度比超过15%的沉积条件下,我们发现一种新形貌,这种形貌是由具有非常好的刻面的晶粒构成的。

High powered, 30kW, DC arc plasma jet CVD was applied to deposit novel structure of self-standing diamond film. 2-, 3- and 4-layered structure films were fabricated by fluctuating the ratio of methane to hydrogen. Scanning electronic spectroscopy （SEM） results showed that the layered structures were composed of columnar grains and very fine grains. Raman spectra showed that the layer with very fine grains possessed the laser scattering feature due to nano-sized diamond grain. A kind of novel morphology with very nice faceted surface of grain was found under very high ratio of methane to hydrogen, which of value was over 15%.