摘要
阐述了基于原子力显微镜(AFM)的弯曲测试测量纳米梁杨氏模量的理论和方法.重点解决了纳米梁杨氏模量测试技术中的3个关键问题:①宽梁条件下杨氏模量理论模型的修正;②纳米梁厚度的精密测量方法;③加载点位置相对于理想点的偏差给测试结果带来的不确定度的评价方法.实验结果表明,本测试结构硅纳米梁杨氏模量的测试值为(183.79±4.18)GPa.
The theory and method of bending test on nanobeam for the measurement of Young's modulus based on atomic force microscope (AFM) are introduced. Three issues are mainly solved during the measurement of Young's modulus of nanobeam: the correction of Young's modulus model for a broad beam; a method for the precise measurement of the thickness of nanobeam; the evaluation of the influence of the load force position on test results. The experimental result of Young's modulus of the silicon nanobeam structure used in this paper is (183.79±4.18) GPa.
出处
《天津大学学报》
EI
CAS
CSCD
北大核心
2007年第7期816-820,共5页
Journal of Tianjin University(Science and Technology)
基金
国家973"纳机电结构加工工艺的评价与表征方法研究"资助项目(G1999033109)
关键词
纳机电系统
纳米梁
杨氏模量
原子力显微镜
弯曲测试
nanoelectromechanical system
nanobeam
Young' s modulus
atomic force microscope ( AFM )
bending test