吸收膜层的光电极值法监控研究

STUDY ON THE ABSORPTION THIN FILM LAYERS MONITORING USING TURNING POINT MONITORING APPROACH OF PHOTOELECTRICITY

膜层厚度的精确控制是提高光学薄膜性能的关键技术。利用膜系的特征矩阵分析了吸收膜层消光系数对监控的影响,并给出了实例分析。给出了确定吸收膜层监控波长和监控次数的方法。最后通过镀制实验,表明考虑膜层消光系数的影响后,即使采用有较大吸收的监控光进行监控,所镀膜层也有较高的监控精度。实测膜系光谱性能良好。

It is a key technique to accurately control the thickness of optical layer. The absorption materials extinction coefficient affection to the monitoring is analysed by the method of characteristic matrix. An example about the affection is analysed. The method to confirming the montoring wavelength and times is afforded. The practical result shows that the capability of films is fine and the monitoring precision of layers is upper even if the influence is considered.