Pd在p型单晶硅(100)表面自催化化学沉积(英文)

Autocatalytic Electroless Deposition of Palladium onto p-Silicon (100)

研究了Pd在氢终止的p型单晶硅(100)表面的自催化化学沉积(AED).在室温下将刻蚀过的硅片浸入常规的HF-PdCl_2-HCl溶液制备了Pd膜.将沉积了Pd的基底作为工作电极,用循环伏安法(CV)、原子力显微镜(AFM)和X射线光电子能谱(XPS)研究了Pd膜的阳极溶出行为和形貌.结果表明,Pd的生长遵循Volmer-Weber (VW)生长模式,Pd膜给出了很好的支持.

The autocatalytic electroless deposition （AED） of palladium onto p-silicon （100） with hydrogen termination was studied. Pd films were prepared by immersing the hydrogen-terminated silicon wafers into conventional HF-PdCl2- HCl solution at room temperature. The anodic stripping behaviors and morphologies of the Pd deposits were studied using cyclic voltammetry （CV）, atomic force microscopy （AFM）, and X-ray photoelectron spectroscopy （XPS）. The results showed that the Pd growth was in Volmer-Weber （VW） mode and the Pd film had good adhesion.