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用脉冲激光法测量金属基复合材料界面强度 被引量:1

EXPERIMENT AND ANALYSIS OF INTERFACE TENSION STRENGTH OF METAL MATRIX COMPOSITES
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摘要 本文采用脉冲激光引发不同材料间界面脱粘的方法,并结合有限元方法对上述脱粘过程进行数值模拟,从而决定界面的拉伸强度。对铜与碳化硅间的界面强度进行了测定,结果表明该界面的拉伸强度为8.36GPa。 A laser spallation experiment technique is used to measure the interface tension strength of Cu/SiC laminate materials. The critical stress amplitude is determined from a computer simulation of the process. It is found that the interface tension strength ranges from 8.19 to 8.56GPa, and the average strength is 8.36 GPa. In the case of Si/SiC, the results given by the paper are in good agreement with the results obtained by Gupta.
出处 《复合材料学报》 EI CAS CSCD 北大核心 1997年第2期50-55,60,共7页 Acta Materiae Compositae Sinica
基金 上海交通大学金属基复合材料国家重点实验室资助 国家自然科学基金
关键词 金属基复合材料 界面拉伸强度 脉冲激光 laser pulse, pressure pulse, interface debonding, reflection wave
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参考文献3

  • 1万亚茗,硕士学位论文,1994年
  • 2李恒德,材料表面与界面,1990年,303页
  • 3甘舜仙,有限元技术与程序,1988年

同被引文献27

  • 1冯爱新,殷苏民,周建忠,等.一种激光冲击复合约束层:中国,200510037965.9[P].2005-03-04.
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  • 3Mittal K L. Adhesion measurement of films and coatings: volume 2 [ M ]. Zeist : VSP International Science Publishers, 2001.
  • 4Weiss P, Sigrist M W. Measurement of coating adhesion strengths by time-resolved interferometric monitoring of laser-induced spallation [ J ]. Nondestructive Testing and Evaluation, 1997, 13(5) :247-291.
  • 5Sartori C, Ohra R, Dubief P. A pulsed laser technique for an envaluation of the spall resistance of sputtered oxide films[J]. Surface and Coatings Technology, 1998, 106(2/3) : 251-261.
  • 6Gupta V. System and method for measuring the interface tensile strength of planar interfaces:US, 5438402 A [P]. 1995 -08 -01 [2013-12-10].
  • 7Yuan J, Gypta V. Measurement of interface strength by the modified laser spallation technique: I experiment and simu- lation of the spallation process[J]. Journal of Applied Physics, 1993, 74(4) :2388-2396.
  • 8周明.激光层裂法定量测试界面结合强度与诊析技术研究[D].镇江:江苏大学,2003.
  • 9张永康,葛涛,殷苏民,等.以冰为约束层的激光冲击处理方法及其装置:中国,200410065544,2[P],2005-04-27[2013-12-10].
  • 10张永康,张雷洪,张凌峰,等.快速制备树脂材料约束层的方法及其装置:中国,200510037970.X[P],2005-10-19【-2013-12-10].

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