高性能导电薄膜的制备

Preparation of Conducting Films with High Performance

采用磁控溅射法在玻璃基底上制备了Cr-Cu-Al-Cr薄膜,用焊接法测试薄膜附着性能,用X射线衍射仪、原子力显微镜和台阶仪对薄膜进行表征,研究溅射过程中以及在高温大气环境下薄膜的防氧化方法,分析薄膜晶粒大小与电性能关系,制备出性能较好的导电膜。

Cr-Cu-Al-Cr films have been grown on glass substrate by magnetron sputtering. The adhesion of the films has been tested by welding method. The films were characterized by x-ray diffraction （XRD）, atomic force microscopy （AFM） and surface profilometer. The way was found to improve the oxidation resistance of the films when the films were deposited and in high temperature circumstance. The relation between the grain size and the electrical properties was also analyzed.