摘要
本文介绍了在863新材料领域资助下最新研制成功的100kw级高功率直流等离子体喷射(DCPlasmaJet)金刚石膜沉积系统。利用该系统在氩气—氢气—甲烷气体系中进行了初步的工艺试验,经过40小时的连续运行,在Φ110mm的基片上沉积出中心厚1.9mm,边沿厚1.6mm的金刚石膜。平均生长速率达44μm/h。
This paper introduces the lastest system of 100kw high power DC plasma jet CVD diamond film,and it was researched successfully by the fund of the state “863” pruject.Diamand film deposition process has been studied basically in a Ar H CH 4 phase.The system has run continuously for 40 hours and the deposited diamond film is 110mm in diameter,central thickness is 1.9mm and 1.6mm at fringe.The average growth rate is 44μm/h.
出处
《河北省科学院学报》
CAS
1997年第1期6-8,共3页
Journal of The Hebei Academy of Sciences