廉价制备大面积金刚石膜的高功率直流等离子体喷射设备的研制

DEVELOPMENT OF HIGH POWER DC PLASMA JET SYSTEM FOR LOW COST AND LARGE AREA DIAMOND PRODUCTION

本文介绍了在８６３新材料领域资助下最新研制成功的１００ｋｗ级高功率直流等离子体喷射（ＤＣＰｌａｓｍａＪｅｔ）金刚石膜沉积系统。利用该系统在氩气—氢气—甲烷气体系中进行了初步的工艺试验，经过４０小时的连续运行，在Φ１１０ｍｍ的基片上沉积出中心厚１．９ｍｍ，边沿厚１．６ｍｍ的金刚石膜。平均生长速率达４４μｍ／ｈ。

This paper introduces the lastest system of 100kw high power DC plasma jet CVD diamond film,and it was researched successfully by the fund of the state “863” pruject.Diamand film deposition process has been studied basically in a Ar H CH 4 phase.The system has run continuously for 40 hours and the deposited diamond film is 110mm in diameter,central thickness is 1.9mm and 1.6mm at fringe.The average growth rate is 44μm/h.