摘要
基于膜分子和气相分子在沉积时竞争的观点,得到压强和温度对薄膜折射率影响的理论模型.模型的研究表明,薄膜折射率随真空压强的增加而降低;并随沉积温度的增加而增加.在不同真空压强和不同沉积温度下制备了氧化锆薄膜,计算了样品的折射率,结果显示的规律和理论模型的规律基本一致.
From the viewpoint of molecular competition, a theoretical model was developed to investigate the effect of vacuum and temperature on the film refraction. It shows that with the increase of vacuum pressure the refractive index decreases, and with the increase of temperature the refractive index increases. Some ZrO2 films were deposited in different vacuum pressures and temperatures and the samples refraction indices were calculated. The results show that the experimental data are basically consistent with that from the model.
出处
《上海理工大学学报》
EI
CAS
北大核心
2007年第2期175-178,共4页
Journal of University of Shanghai For Science and Technology
基金
上海市重点学科建设资助项目(T0501)
上海高校选拔培养优秀青年教师科研专项基金资助项目(061Z011)
关键词
压强
温度
薄膜沉积
折射率
pressure
temperature
thin film deposition
refractive index
