摘要
利用真空磁过滤弧沉积技术制备出一种高ｓｐ３含量的非晶碳膜———非晶金刚石薄膜，并对这种非晶金刚石薄膜的场电子发射特性及其发射机理进行了研究．实验结果表明，在阈值电场低于２０Ｖ／μｍ情况下，得到的场发射电流达２０—４０μＡ，薄膜的电子发射行为符合ＦｏｗｌｅｒＮｏｒｄｈｅｉｍ场发射理论．研究表明。
Abstract One new diamond form,the amorphous diamond (a D) film,is prepared by filtered arc deposition.The field emission properties and mechanism of a D film are presented,to our knowledge,for the first time.The field emission current of more than 20μA is detected below a field intensity of 20V/μm. This result is even superior to all previously reported results.The Fowler Nordheim field emission behavior has been observed in a D films.The a D films have a low work function and negative electron affinity.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1997年第7期1444-1448,共5页
Acta Physica Sinica
基金
国家自然科学基金
