中频磁控溅射法制备氧化锌钇薄膜及其性能研究(英文)

Study on the Preparation of ZYO Thin Films by Middle Frequency Alternative Magnetron Sputtering and Their Properties

利用中频磁控溅射法,溅射氧化锌钇(ZYO)陶瓷靶材,在玻璃基底上制备ZYO透明导电薄膜。研究了氧化钇掺杂量和基底温度对薄膜的结构、电学性能和光学性能的影响。结果表明,ZYO薄膜为钎锌矿型结构,呈c轴择优取向,平均可见光透过率(400～800nm)达到80%以上。制备的ZYO薄膜具有的最低电阻率为1.18×10-3Ωcm。

Y-doped zinc oxide （ZYO） thin films were prepared by middle frequency alternative magnetron sputtering on glass substrates with ZYO ceramic targets. The influences of Y2O3 content and substrate temperature on microstructures, optical and electrical properties of the thin films have been investigated. The results show that the ZYO films are of the structure of wurtzite type with high c - axis orientation. The lowest resistivity of the films in this work is 1.18 × 10^-3Ωcm with the transmittance of over 80% at the visible region.