摘要
激光晶化是一种制作晶硅薄膜器件(如薄膜晶体管、太阳能电池)很有效的技术。展望了低温多晶硅薄膜的应用前景,详细介绍了近几年激光晶化制备多晶硅薄膜技术的研究成果,并就激光对非晶硅作用的原理作了简单讨论。
Laser crystallization is an effective technique for obtaining high-performance polycrystallie Si thinfilm devices, such as TFTs and solar cells. The future development of low-temperature polycrystalline silicon thin film is prospected. Mean-while, the latest progress about the laserinduced crystallization of amorphous silicon thin film is introduced in detail. The working principles of laser and amorphous silicon are reviewed briefly.
出处
《激光与光电子学进展》
CSCD
北大核心
2007年第11期52-57,共6页
Laser & Optoelectronics Progress
关键词
薄膜
低温多晶硅
激光晶化
玻璃衬底
thin film
low.temperature polycrystalline silicon
laser-induced crystallization
glass substrate
