退火温度对TiO_2薄膜结构与光学性能的影响

Influence of annealing temperature on the structure and optical properties of TiO_2 thin films

研究退火温度对薄膜相结构、表面化学组成、形貌及光学性能的影响。采用射频磁控溅射法在单晶硅片和石英玻璃片上负载TiO2薄膜,通过X射线衍射(XRD)、原子力显微镜(AFM)、X光电子能谱(XPS)和紫外可见光谱(UV-vis)对其进行表征。结果表明,常温制备400℃以下退火的TiO2薄膜为无定形结构,400℃以上退火的TiO2薄膜出现锐钛矿相,600℃以上退火的TiO2薄膜开始出现金红石相,退火温度在1000℃以上时样品已经完全转变为金红石相;高温退火薄膜的组成为TiOx;随着退火温度的升高,薄膜透射率下降,折射率和消光系数有所增加。

The structure, component, surface profile and optical properties of the thin films prepared under different annealing temperatures were studied in details. TiO2 thin films were deposited on silicon substrate and quartz substrate by RF magnetron sputtering at room-temperature. XRD, AFM, XPS and UV-vis were employed to characterize the samples. It is found that,annealed at temperatures below 400℃, the TiO2 thin films is amorphous. Annealed at 400℃, anatase phase appeared in TiO2 thin films. Annealed at 600℃, futile phase appeared in TiO2 thin films. Annealed at temperatures above 1000℃, anatase phase changed into rutile phase completely. The component of the thin films annealed at higher temperature is TiOx. As annealing temperature increase, the transmission rate of the thin films decreases, the refractive index and extinction coefficient of the thin films increases.