电沉积技术制备钼酸钡薄膜及其特性表征

Electrodeposition and characterization of barium molybdate thin films

采用恒电流电沉积技术，在不同衬底（金属钼片、镀金的硅片、ITO导电玻璃）上，不同溶液酸碱性的条件下制备出了具有白钨矿结构的钼酸钡薄膜，利用X射线衍射仪（XRD）、扫描电子显微镜（SEM）、原子力显微镜（AFM）对制备的薄膜进行了分析表征。分析了利用电沉积方法制备的钼酸钡薄膜的成膜机制．实验结果表明：在室温环境下，利用电沉积技术，在不同材质的衬底（金属钼片、镀金的硅片和ITO导电玻璃）上，可以制备出具有白钨矿结构钼酸钡薄膜，不同材质的衬底会影响到薄膜晶粒的形状进而影响薄膜的表面形貌和致密性，用镀金的硅片（Au-Si片）作衬底时，制备的钼酸钡薄膜晶粒更加饱满，晶体生长呈四方锥形，晶界清晰。

Barium molybdate （BaMoO4） thin films with scheelite-structure have been galvanostatically electrodeposited on different substrates（molybdenum metal substrate, Au-coated Si substrate, ITO conducting glass substrate）. Micro- structural properties of the prepared films have been determined through X-ray diffraction analysis（XRD）. The surface morphology of the deposited films have been investigated by atomic force microscope（AFM）, and its thickness has been obtained by scanning electron microscope（SEM）. The growth mechanism of the barium molybdate functional thin film has been analyzed. The experimental results revealed that scheelite-structured barium molybdate thin films have been prepared on different substrates via galvanostatical electrodeposition technique at room temperature, respectively. Substrate played an important role on control the crystalline grains shape of the films, and moreover, affected surface morphology and compactness. The crystalline grains of the barium molybdate films deposited on Au-coated Si substrate were well-stacked, the crystals of the barium molybdate grown in tetragonal tapers, and the grain boundaries were well clear.