基于氧化铝模板表面上的钴反点阵薄膜的制备、表征及模拟

Fabrication, investigation and simulation of cobalt antidot arrays on anodic aluminum oxide templates

采用铝阳极氧化方法结合底部开孔处理的方法制备了孔分布有序排列、孔径均匀、孔间距分别为60，100，150nm的3种阳极氧化铝（AAO）模板．采用磁控溅射方法在其表面上溅射Co薄膜．利用扫描电镜对材料进行了表征．采用MPMS测量了孔间距为150nm磁性反点阵的磁滞回线，并利用微磁学计算软件OOMMF模拟反点阵的磁化反转并与实验结果相比较。模拟结果表明磁化反转过程受到孔的影响。实测磁滞回线与模拟有偏差，最后给出了产生差别的可能原因．

We have fabricated three kinds of AAO template with ordered pores distribution, uniform pores diameter and interpore distance about 60, 100, 150nm respectively using electrochemical method combined with bottom pores-opening method. Co films were deposited on the surface of AAO by applying magnetron sputtering. Magnetic antidot arrays were observed by SEM. We have measured the hysteresis loop of cobalt antidot array with 150nm interpores distance by using MPMS. Also, we have simulated the magnetic reverse process using micromagnetic software： OOMMF and compared them with measurement data. Simulation results indicated that the magnetic reverse process was affected by the static magnetic field produced by pores. There are some difference between the experiment and simulation, and we give the possible reason at last.