凹凸结构纳米多孔氧化硅的制备

Preparation of nanoscale porous silica with convex-concave structure

采用金属辅助化学反应刻蚀法制备了具有凹凸结构的纳米多孔氧化硅，利用光学显微镜、原子力显微镜、扫描电子显微镜和透射电子显微镜等，研究了刻蚀时间对纳米多孔氧化硅形貌结构的影响。结果表明：刻蚀初期在强氧化性酸的作用下，硅表面形成一层氧化硅薄膜，进一步刻蚀，氧化硅薄膜出现规则的周期性凹凸结构裂纹。最后展望了这种凹凸结构纳米多孔氧化硅的应用前景。

Nanoscale porous silica was prepared by using metal assistance chemical reaction etching method. Several research measures were used to investigate the morphologies and structure of porous silica,such as optical microscope, atomic force microscope, scanning electron microscrope. The result showed that silica film was formed on the surface of Si wafe in the initial stage. With etching time elapsing, periodical silica film with convex-concave structure was formed and the possible reason was proposed. At last, perspective of porous silica with convex-concave structure was prospected.