液相法新工艺制备类金刚石膜的结构及其电学性能分析

The structure and electrics capability of diamond-like carbon films prepared by new means of the liquid phase-electrodeposition technique

采用液相法，在以硅片为阳极的工艺条件下沉积了一层DLC薄膜。通过Raman和FFIR光谱的分析，证实了该薄膜为含氢类金刚石薄膜（a-C：H）。并且对薄膜的交流阻抗谱（EIS）进行了测试和分析，确定该膜有非常高的阻抗值和良好的耐蚀性。

Dliamond-like carbon films were prepared on Si plate which was set as anode in electrolyte. The films were characterized by FTIR and Raman spectroscopy. The results showed that the DLC films were a-C：H films, and the EIS showed that the films own higher resistance and good corrosion resistance characteristics.