锡基氧化物薄膜的制备及结构表征

Preparation and structure of tin-based oxide thin film

采用直流反应溅射并结合热处理工艺制备锡基氧化物薄膜（SnOx，1≤x≤2），利用扫描电镜（SEM）、能谱仪（EDX）、x射线衍射仪（XRD）考察退火温度对薄膜表面形貌、组成和结构的影响，并通过恒流充放电初步考察薄膜的电化学性能。研究结果表明，在400-600℃退火温度下制备的SnOx薄膜表面光滑、结构致密；随着退火温度的升高，薄膜中SnO的含量逐渐减少，SnO2的含量逐渐增加，薄膜的晶粒尺寸增大，大小为30-50nm；600℃退火2h获得的SnOx薄膜具有良好的电化学循环稳定性，有望成为高性能的全固态薄膜锂电池阳极材料。

Tin base oxide （SnOx,1≤x≤2） thin film was prepared by direct-current reactive sputtering with heat treatment assist process. Scanning electron microscope （SEM）, energy dispersive X-ray （EDX） and X-ray diffraction （XRD） were used to inspect the influence of annealing temperature on its surface morphology, composition and structure. Furthermore, The electrochemistry performance of SnOx thin film was preliminary examined through the constant current charge-discharge technique. The results indicate that the dense SnOx thin films with smooth surface are obtained at 400-600℃ annealing for 2h. With the increase of annealing temperature, the SnO content gradually reduced while the SnO2 content increased and the particle size become larger （30-50nm）. The SnOx thin film annealed at 600℃ for 2h has superior electrochemical cycling properties and is expected to become high-performance anode material for all-solid-state thin film lithium ion battery.