Fabrication of Two-Dimensional Photonic Crystals with Controlled Defects by Combination of Holographic Lithography and Two-Photon Polymerization

一个新第三的相片聚合物系统在由单个光子、二光子的相片聚合的联合与控制缺点制作 photonic 晶体(PhCs ) 被使用。以前的过程能在一步舞记录与生产 PhCs 一低力量(十 mW ) 在 532 nm 的连续波浪的激光，当后者能创造需要的缺点时。材料，光安装和初步的试验性的结果的准备被给。与另外的方法相比，这条途径为可见的光的使用更可存取、方便并且有快速并且经济地在大规模做 PhCs 并且确切介绍任何缺点的优点，特别为三维的结构。

A new ternary photopolymer system is used in fabricating photonic crystals （PhCs） with controlled defects by combination of single-photon and two-photon photopolymerization. The former process can produce PhCs in one-step recording with a low-power （tens mW） continuous-wave laser at 532nm, while the latter can create desired defects. The preparation of the material, the optical setup and the preliminary experimental results are given. Compared with other methods, this approach is much more accessible and convenient for use of visible light and has advantages of making PhCs in a large scale quickly and economicaJly and introducing any defects exactly, especially for three-dimensional structures.