钛合金表面Si-N-O薄膜的制备及其性能研究

Fabrication and characterizaton of Si-N-O films on the surface of Ti alloy

采用非平衡磁控溅射（UBMS450）法在钛合金表面制备了Si-N-O薄膜。研究结果表明：氮气流量对薄膜的化学结构、力学性能有很大影响。X射线光电子能谱（XPs）表征显示，随着氮气流量由5ml／min增加到20ml／min，薄膜中的N／Si比从0．36增加到了1．1，力学性能在氮气流量为15ml／min时达到最大值。

Silicon nitride films were prepared on the suface of tianium alloys by unbalance magnetron sputtering （UBMS）.XPS chracterization results indicate that the N/Si rate of Si-N-O film increases from 0.36 to 1.1 when the N2 gas flow rate increases from 5 to 20 ml/min. Moreover, the Si-N-O films obtained the best mechemical properties when the N2 gas flow rate reached 15 ml/min.