摘要
采用非平衡磁控溅射(UBMS450)法在钛合金表面制备了Si-N-O薄膜。研究结果表明:氮气流量对薄膜的化学结构、力学性能有很大影响。X射线光电子能谱(XPs)表征显示,随着氮气流量由5ml/min增加到20ml/min,薄膜中的N/Si比从0.36增加到了1.1,力学性能在氮气流量为15ml/min时达到最大值。
Silicon nitride films were prepared on the suface of tianium alloys by unbalance magnetron sputtering (UBMS).XPS chracterization results indicate that the N/Si rate of Si-N-O film increases from 0.36 to 1.1 when the N2 gas flow rate increases from 5 to 20 ml/min. Moreover, the Si-N-O films obtained the best mechemical properties when the N2 gas flow rate reached 15 ml/min.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2007年第A05期1773-1775,共3页
Journal of Functional Materials
基金
国家自然科学基金资助项目(30570502)
关键词
钛合金Si-N-O薄膜
磁控溅射
力学性能
Si-N-O film
magnetron sputtering
titanium alloys
mechanical properties