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Microstructure and electrical properties of CeO_2 ultra-thin films for MFIS FeRAM applications

Microstructure and electrical properties of CeO_2 ultra-thin films for MFIS FeRAM applications
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摘要 A detailed investigation about the dependence of microstructure and electrical properties on annealing temperature was carried out for cerium oxide(CeO2) ultra-thin films(18 nm to 110 nm) on n-type Si(100) substrates by RF magnetron sputtering. Substrate temperature was kept constant at 400 ℃ for all samples. The as-deposited films were subsequently annealed in air ambient at 700,800 and 900 ℃ for 1 h respectively. The crystallinity and surface morphology of the CeO2 films were analyzed with X-ray diffractometer(XRD),scanning electron microscope(SEM),atomic force microscope(AFM) and Raman scattering measurement. Electrical properties of the Au/CeO2/Si/Au structure were examined by high frequency capacitance-voltage(C-V) characteristics at 1 MHz and leakage current density-electric field(J-E) characteristics. A Raman peak of the CeO2 thin films was seen at 463 cm-1. From C-V data,these films exhibit dielectric constants ranging from 18 to 23,the hysteresis width(-VFB) ranging from 0.015 V to 0.12 V and the density of trapped charges ranging from 1.45×1011 to 3.01×1011 cm-2. A leakage current of 4.75×10-8 -9.0×10-7 A/cm2 at 2 MV/cm was observed. The experimental results show that the CeO2 buffer layers are suitable for non-volatile metal-ferroelectric-insulator-semiconductor(MFIS) structure field-effect-transistors(FETs) memory applications. A detailed investigation about the dependence of microstructure and electrical properties on annealing temperature was carried out for cerium oxide(CeO2) ultra-thin films (18 nm to 110 nm) on n-type Si(100) substrates by RF magnetron sputtering. Substrate temperature was kept constant at 400℃ for all samples. The as-deposited films were subsequently annealed in air ambient at 700, 800 and 900 ℃ for 1 h respectively. The crystallinity and surface morphology of the CeO2 films were analyzed with X-ray diffractometer(XRD), scanning electron microscope(SEM), atomic force microscope(AFM) and Raman scattering measurement. Electrical properties of the Au/CeO2/Si/Au structure were examined by high frequency capacitance--voltage (C--V) characteristics at 1 MHz and leakage current density---electric field (J--E) characteristics. A Raman peak of the CeO2 thin films was seen at 463 cm^-1. From C--V data, these films exhibit dielectric constants ranging from 18 to 23, the hysteresis width (△ VVB) ranging from 0.015 V to 0.12 V and the density of trapped charges ranging from 1.45×10^11 to 3.01×10^11 cm^-2. A leakage current of 4.75×10^-8 -9.0~×10^-7 A/cm^2 at 2 MV/cm was observed. The experimental results show that the CeO2 buffer layers are suitable for non-volatile metal- ferroelectric-insulator-semiconductor(MFIS) structure field-effect-transistors(FETs) memory applications.
出处 《中国有色金属学会会刊:英文版》 CSCD 2007年第A02期741-746,共6页 Transactions of Nonferrous Metals Society of China
基金 Project(076044) supported by the Cultivation Fund of the Key Scientific and Technical Innovation Projects, Ministry of Education of China Project(KF0602) supported by the Open Project Program of LDMAT (Xiangtan University), Ministry of Education, China
关键词 二氧化铈超薄膜 微观结构 介电性能 射频磁电管反应溅射法 CeO2 thin film RF magnetron sputtering microstructure and electrical properties MFISFETs memory applications
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