摘要
Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target. The influence of AlN content on the phase change was studied by synthesizing Cr1-xAlxN coatings with different x values. The effects of substrate negative bias on the surface morphology,deposition rate and phase structure were investigated. As the aluminum content increases,the structure of(Cr1-xAlx)N changes from B1(NaCl) phase to B4(wurtzite) phase. The critical content of AlN solubilized in B1(NaCl) lattice is close to 0.7. With the increasing pulse negative bias,the deposition rate decreases constantly,the droplet contamination is more serious,the ion-etching effect on coating surface is more obvious,and the change of preferred orientation and the shift of XRD peak take place.
Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target. The influence of AlN content on the phase change was studied by synthesizing Cr1-xAlxN coatings with different x values. The effects of substrate negative bias on the surface morphology, deposition rate and phase structure were investigated. As the aluminum content increases, the structure of (Cr1-xAlx)N changes from Bl(NaCl) phase to B4(wurtzite) phase. The critical content of A1N solubilized in B 1 (NaCl) lattice is close to 0.7. With the increasing pulse negative bias, the deposition rate decreases constantly, the droplet contamination is more serious, the ion-etching effect on coating surface is more obvious, and the change of preferred orientation and the shift of XRD peak take place.
出处
《中国有色金属学会会刊:英文版》
CSCD
2007年第A02期780-784,共5页
Transactions of Nonferrous Metals Society of China
基金
Project(50401022) supported by the National Natural Science Foundation of China
Project(0650034) supported by the Natural Science Foundation of Jiangxi Province, China
关键词
铬铝氮涂层
电弧离子电镀法
电沉积
相变
chromium aluminum nitride
arc ion plating
phase change
pulse bias