摘要
物理气相沉积（PVD）已得到广泛的工业应用．而双重处理、低温沉积TiN和Ti2N等新的涂层技术目前正在研究中，其应用领域人们尚未完全了解。本文则对这些涂层的基本工艺、主要性能和应用前景作一简要介绍。
Physical vapor deposit ion coating are widely used in industry.New coating technology,such as duplex treatment,TiN deposition at low temperature and Ti2N coatings,are still under investigation and their field of application is not yet fully known.This paper describes the description,properties and future application of these coating systems
出处
《稀有金属与硬质合金》
CAS
CSCD
1997年第3期60-62,共3页
Rare Metals and Cemented Carbides
关键词
涂层技术
PVD
气相沉积
表面处理
Duplex treatment,coating technology, low temperature PVD
