平面直流磁控溅射放电等离子体模拟研究进展

Progress in Discharge Plasma Simulation of Planar DC Magnetron Sputtering

放电等离子模拟是平面直流磁控溅射装置系统仿真的一个重要的子过程。本文根据模型的种类,求解问题的维数以及自洽性对磁控放电等离子体模拟方法进行了分类,并通过介绍不同种类的仿真模型,诸如动力学模型,流体模型,粒子模型,混合模型以及简化模型,根据平面直流磁控溅射放电的特殊性,对这些模型在该装置等离子模拟中的适用性进行了分析。兼顾问题求解的速度和质量,本文认为二维自洽粒子模拟与三维非自洽粒子模拟是目前需要重点研究的两种方法。最后作者对磁控放电等离子体模拟的进一步发展进行了展望。

The latest progress in discharge plasnka simulation of planar DC magnetron sputtering was tentatively reviewed. The simulation methods were elassified aeeording to the type, dimension and self-eonsistenee of the models. Moreover, the applieability of different models, ineluding the kinetie model, the fluid model, the partieke model, the hybrid model and the simplified model, was diseussed for the partieularity of the DC planar magnetron diseharge. In eompromising the preeision and simplieity, we suggest that the 2D self-eonsistent and 3D non-self-eonsis- tent simulations with partiele model should be the widely used ones. Further study in planar magnetron sputtering simulation was also proposed.