期刊文献+

离子束辅助沉积改善铝薄膜的取向生长

Highly Orientated Al Film Grown on LiNbO_3 by Ion Beam Assisted Deposition
下载PDF
导出
摘要 高性能的铝薄膜因具有低的声阻抗而广泛应用于声表面波器件的制备。本文运用Ar离子束辅助沉积技术,在64°Y-X切向的铌酸锂基片上成功的制备出(111)高度取向的铝薄膜,并研究了Ar离子的注入角度对薄膜的织构形成的影响。结果表明,薄膜织构度对辅助离子束入射角度非常敏感,在辅助离子束入射角为35°时,薄膜(111)织构最强,电阻率最小,附着力最好,适合于声表面波器件中的应用。 Highly ( 111 ) orientated A1 fdms were grown on 64° Y-X cut LiNbO3 substrates by Ar ion beam assisted deposition. The A1 films were characterized with scanning electron microscopy(SEM) to understand the influence of LiNbO3 orientation and ion beam incident angle on AI film textures. The results show that the incident angle significantly affects the film quality. For example, at an angle of 35°, AI ( 111 ) is strongly textured with lowest resistivity and the strongest interracial adhesion. We suggest that the films are good surface acoustic wave(SAW) materials.
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2007年第6期500-503,共4页 Chinese Journal of Vacuum Science and Technology
基金 国家自然科学基金资助(No.50325105) 国家863计划项目(No.2006AA032435)
关键词 高织构铝薄膜 离子束辅助沉积 入射角 机械性能 沟道效应 Highly textured Al film, Ion beam assisted deposition, Impinging angle, Mechanical properties, Channeling effect
  • 相关文献

参考文献26

  • 1V.F. Dmitriev. Teeh Phys,2003,48:231
  • 2Roh Y,Lee Y,Lee S.Jpn J Appl Phys, 2001, 40 :5173 .
  • 3Yammouehi K,Odagaw.H,Kojima T.Electron Lett. 1998, 34 :702 .
  • 4李晖,潘峰.声表面波器件的研究进展[J].真空科学与技术,2001,21(5):376-380. 被引量:14
  • 5陈菁菁,李冬梅,潘峰.金刚石声表面波器件的研究与进展[J].真空科学与技术,2003,23(6):417-424. 被引量:5
  • 6Butt M Z,Zubair M,Ul-Haq I. J Mater Sci, 2000, 35 :6139 .
  • 7Lathm J I,Shreve W R,Tolar N J,et al.Thin Solid Films, 1979, 64 :9 .
  • 8Ebata Y,Sato K,Morishita S. Proceedings of the IEEE Ultrasonic Symposium. 1981, 1 :111 .
  • 9Han B Q, Mohamed F A, Lavemia E J. J Mater Sci, 2003,38 : 3319
  • 10Yuhara A, Watanabe H, Yamada J. Jpn J Appl Phys, 1987, 26 : 135

二级参考文献30

  • 1Higaki K, Nakahata H,Kitabayashi H et al.IEEE T ULTRASON FERR, 1997,44(6): 1395
  • 2Kadota M, Kondoh C. IEEE T ULTRASON FERR, 1997,44(3) :658
  • 3Springer A, Hollerweger F, Weigel R et al. IEEE T MICROW THEORY, 1999,47(12): 2312
  • 4Bausk E V. IEEE T ULTRASON FERR, 1999,46(5): 1276
  • 5Yamarouchi K, Nakagawa H, Qureshi J A et al. Jpn J Appl Phys, 1999,38: 3270
  • 6Tong X J, Zhang D. Sersors and Actuators, 1999,78:160
  • 7Tashtoush N M,Cheeke J D N,Eddy N. Sensors and Actuators B, 1998,49:218
  • 8Rayleigh L. Proc Math Soc London,1885,17:4
  • 9Shisaki T, Leki E,Kawabata A.Appl Phys Lett,1976,28:475
  • 10White R M,Voltmer F W.Appl Phys Lett,1965,7:314

共引文献17

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部