低能电子束制备硅基纳米薄膜微结构研究

Micro/nano-structure of thin film deposited on silicon substrate by low-energy electron beam

本文提出了一种新颖的结合自组装技术和电子束直写曝光以及选择性化学沉积制备图案化薄膜方法。利用X-射线光电子能谱(XPS),扫描电子显微镜(SEM),透射电子显微镜(TEM)紫外可见光谱仪(Analytic Jena AG)进行了表征。结果表明该方法取得了选择性较好的图案化金薄膜微结构图形。文中对胶体金纳米颗粒尺寸的选择以及金薄膜图案的粘附性能也进行了探讨。该方法有望应用于微/纳电子工业中。

A novel process combining the self-assembly technique with electron beam lithography and selective chemical deposition was proposed for patterned film preparation. The X-ray Photoelectron Spectroscopy （XPS）, Scanning electron microscope （SEM）, Transmission Electron Microscope （TEM） and UV-VIS spectroscope were used to characterize the patterned film. It was shown that the patterned goldfihn with good selectivity can be obtained by the process proposed. The selection of colloidal particle size and adhesivity of gold patterned film were discussed. This process is expected to be applied to micro/ nano electronic industry.