溅射法制备ZnS∶Er^(3+)薄膜的微结构研究

Microstructural Studies of ZnS∶Er 3+ Thin Film Prepared by RF Magnetron Sputtering

利用射频磁控溅射法制备掺铒硫化锌薄膜，用Ｘ射线衍射和Ｘ射线光电子能谱技术，研究薄膜微结构，发现薄膜中多晶沉积有择优取向趋势，掺杂的铒有表面集聚现象，这将对薄膜的激发态产生影响．

The microstructure of zinc sulfide thin film doped with erbium,prepared by radio frequence megnetron sputtering (RFMS),was studied by using X ray diffraction (XRD)and X ray photoelectron spectroscopy (XPS).It is found that the polycrystal deposition in the thin film tends to a preferential orientation and that there is a phenomenon of doped erbinm gathering in the surface layer of the thin film.And these will affect the exciting states in the thin film.