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SU-8胶曝光衍射效应的模拟及丙三醇补偿方法

Simulation of the Diffraction Effect in Exposure on a SU-8 Photoresist and the Glycerol Compensated Method
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摘要 基于SU-8胶的UV-LIGA技术是MEMS中制备高深宽比结构的一种重要方法,但由于衍射效应会使结构的侧壁不再垂直.根据菲涅耳衍射模型,考虑了丙三醇/SU-8界面的反射和折射现象,模拟了丙三醇填充在掩膜版和光刻胶之间时的刻蚀图形.计算结果与已有的实验进行了比较,模型基本可以描述这种光刻过程,可在设计时作为参考. According to a Fresnel diffraction model,and considering the reflection and refraction at the glycerol/SU-8 inter-face, this paper simulates the aerial image when glycerol is applied between the photomask and resist. Compared to the exper-imental results,the model can describe the lithography process competently and be applied in design.
作者 朱真 黄庆安 李伟华 周再发 冯明
机构地区 东南大学MEMS教育部重点实验室
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2007年第12期2011-2017,共7页 半导体学报（英文版）
基金 国家杰出青年科学基金资助项目(批准号:50325519)~~
关键词 SU-8胶 菲涅耳衍射 丙三醇 SU-8 photoresist Fresnel diffraction glycerol
分类号 TP211.4 [自动化与计算机技术—检测技术与自动化装置]
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参考文献12

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二级参考文献28

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共引文献10

Journal of Semiconductors
2007年 第12期

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