摘要
对SDS－2型电子束曝光机偏放系统进行了电磁场、电源、数字信号等三方面的抗干扰改造，因而扫描系统的干扰得到了较好的抑制，使用改造后的偏放系统扫出的版，图形质量和线条分辨率都得到了提高。
We reformed a deflection amplifier system of SDS-2 electron beam machine with anti-disturbing techniques against electromagnetic field,power supply and digital signal. Therefore the disturbance to the scanning system is greatly reduced. Using the reformed deflection amplifier system the quality of pattern and the line resolution of the mask are improved.
出处
《微细加工技术》
1997年第2期20-22,共3页
Microfabrication Technology
关键词
电子束曝光机
偏放系统
抗干扰
electron-beam lithography machine
deflection amplifier system
anti-disturbing
