摘要
Titanium dioxide films were firstly deposited on glass substrate by DBD-CVD （dielectric barrier discharge enhanced chemical vapor deposition） technique. The structure of the films was investigated by X-ray diffraction （XRD）, scanning electron microscopy （SEM）. TiO2 films deposited under atmosphere pressure show preferred orientation, and exhibit columnar-like structure, while TiO2 films deposited under low gas pressure show no preferred orientation. The columnar-like structure with preferred orientation exhibits higher photocatalytic efficiency, since the columnar structure has larger surface area. However, it contributes little to the improvement of hydrophilicity. DBD-CVD is an alternative method to prepare photocatalytic TiO2 for its well-controllable property.
Titanium dioxide films were firstly deposited on glass substrate by DBD-CVD （dielectric barrier discharge enhanced chemical vapor deposition） technique. The structure of the films was investigated by X-ray diffraction （XRD）, scanning electron microscopy （SEM）. TiO2 films deposited under atmosphere pressure show preferred orientation, and exhibit columnar-like structure, while TiO2 films deposited under low gas pressure show no preferred orientation. The columnar-like structure with preferred orientation exhibits higher photocatalytic efficiency, since the columnar structure has larger surface area. However, it contributes little to the improvement of hydrophilicity. DBD-CVD is an alternative method to prepare photocatalytic TiO2 for its well-controllable property.
